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Graphite MF Magnetron Sputtering Coating Machine , Jet Black Decoration PVD Plating Equipment

Categories PVD Jet Black Coating Equipment
Brand Name: ROYAL
Model Number: RTAS1250
Certification: CE
Place of Origin: Made in China
MOQ: 1 set
Price: negotiable
Payment Terms: L/C, D/A, D/P, T/T
Supply Ability: 6 sets per month
Delivery Time: 12 weeks
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Deposition Sources: Steered Cathodic Arc + MF Sputtering Cathode
Technique: PVD, Balanced/Unbalanced Magentron Sputtering Cathode
Applications: steel precision fasteners, screws, camera metals
Film Features: wear resistance, strong adhesion, decorative coating colors
Factory Location: Shanghai city, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine operation, maintenance, coating process Recipes, program
Warranty: Limited warranty 1 year for free, whole life for machine
OEM & ODM: available, we support tailor made design and fabrication
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Graphite MF Magnetron Sputtering Coating Machine , Jet Black Decoration PVD Plating Equipment


Graphite PVD Vacuum Coating Machine / Jet Black Decoration PVD Color Finishes


Graphite PVD Vacuum Coating Machine Structures:

Deposition Sources
Steered Circular Arc sources for evaporation of solid metal target;
2 pairs of MF unblanced sputtering cathodes for graphite thin film layer deposition;
Bias Power Supply for ion bomboardment to form the plasma area for pre-treatment;
Anode Linear Ion Source Unit ( for optional) PACVD and PECVD processing;
Cryopump ( Polycold) for water molecular condensation ( for optional)
Other Modules
1. Vacuum Chamber
2. Rouhging Vacuum Pumping System (Backing Pump Package)
3. High Vacuum Pumping System ( Magnetically Suspension Molecular Pump)
4. Electrical Control and Operation System
5. Auxiliarry Facility System (Sub System)
6. Deposition System: MF sputtering cathode, MF power supply, Bias Power Supply Ion source for optional


Graphite PVD Vacuum Coating Machine Performance
1. Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.
2. Operating Vacuum Pressure: 1.0×10-4 Torr.
3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)
4. Metalizing material (sputtering + Arc evaporation): Ni, Cu, Ag, Au, Ti, Zr, Cr, TiN, TiC, TiAlN, CrN, CrC, etc.
5. Operating Model: Full Automatically /Semi-Auto/ Manually

What is MF Sputtering?

Compared with DC and RF sputtering, Mid-Frequency sputtering has become a main thin film sputtering technique for mass production of coating, particularly for the film deposition of dielectric and non-conductive film coatings on surfaces such as optical coatings, solar panels, multiple layers, composite material film etc.
It is replacing RF sputtering due to it operated with kHz rather than MHz for a much faster deposition rate and also can avoid the Target poisoning during compound thin film deposition like DC.

MF sputtering targets always existed with two-sets. Two cathodes are used with an AC current switched back and forth between them which cleans the target surface with each reversal to reduce the charge build up on dielectrics that leads to arcing which can spew droplets into the plasma and prevent uniform thin film growth--- which is what we called Target Poisoning.

The Metal Graphite Decoration MF Sputtering System sizes:
Chamber Inner Size: Dia 1200 mm ~ 1600mm
Chamber Inner Height: 1250mm ~ 1300mm

Customized machine sizes are also available based on specular demand of 3D products.

MF Sputtering System RTAC1250-SPMF Specifications

MODELRTAC1250-SPMF
TECHNOLOGYMF Magnetron Sputtering + Ion Plating
MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1250*H1250mm
CHAMBER TYPECylinder, vertical, 1-door
SPUTTERING SYSTEMExclusively design for thin black film deposition
DEPOSITION MATERIALAluminum, Silver, Copper, Chrome, Stainless Steel,
Nickel
DEPOSITION SOURCE2 sets MF Cylindrical Sputtering Targets + 8 Steered Cathodic Arc Sources + Ion Source For optional
GASMFC- 4 ways, Ar, N2, O2, C2H2
CONTROLPLC(Programmable Logic Controller) +
PUMP SYSTEMSV300B - 1 set (Leybold)
WAU1001 - 1 sets (Leybold)
D60T- 1 set (Leybold)
Turbo Molecular Pumps: 2* F-400/3500
PRE-TREATMENTBias power supply: 1*36 KW
SAFETY SYSTEMNumerous safety interlocks to protect operators
COOLINGCold Water
POWER ELECTRICAL480V/3 phases/60HZ ( USA compliant)
460V/3 phases/50HZ ( Asia compliant)
380V/3 phases/50HZ ( EU-CE compliant)
FOOTPRINTL3000*W3000*H2000mm
TOTAL WEIGHT7.0 T
FOOTPRINT( L*W*H) 5000*4000 *4000 MM
CYCLE TIME30~40 minutes (depending on substrate material,
substrate geometry and environmental conditions)
POWER MAX..155 KW
AVERAGE POWER
CONSUMPTION (APPROX.)
75 KW




Graphite PVD Vacuum Coating Machine is an integrated multiple deposition sources machine to general graphite, jet black, blue color etc. decorations on metal parts, stainless steel objects. Particularly used for high end class luxury products like: electronics: smart phone, camera, laptop, golf, spoon, forks, knife, door handle, faucets; jewelries of finger rings, necklace, ear rings, bracelets, wrist watches etc.






Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Quality Graphite MF  Magnetron Sputtering Coating Machine ,  Jet Black Decoration PVD Plating Equipment for sale
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